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Cited article:

Improvement of prediction models for dry etching characteristics by introducing plasma parameters as explanatory variables

Yasuhiro Nojiri, Kenta Tanaka, Takumi Shimosuki, Moe Kaneko and Hisataka Hayashi
Japanese Journal of Applied Physics 64 (11) 116505 (2025)
https://doi.org/10.35848/1347-4065/ae15d0